China Pushes for Semiconductor Independence with EUV Machine Development

China is intensifying its drive to create homegrown extreme ultraviolet lithography systems, seeking to reduce its reliance on Dutch firm ASML, which currently dominates the market for this essential chip manufacturing technology. State-supported enterprises in China have achieved notable advancements in developing crucial components, but industry analysts believe a fully operational domestic EUV machine is still several years from realization.

Export Restrictions Fuel Self-Sufficiency Efforts

Export controls imposed by the United States and the Netherlands, which prevent ASML from selling its most advanced lithography equipment to China, have motivated Beijing to pursue greater technological autonomy. Achieving a functional domestic EUV system would represent a significant milestone in China's quest for semiconductor independence, though matching ASML's decades of accumulated innovation presents a substantial technical hurdle.